Moriya, Japan

Shintaro Kawata


Average Co-Inventor Count = 1.5

ph-index = 7

Forward Citations = 209(Granted Patents)


Location History:

  • Kawasaki, JP (1995 - 1996)
  • Moriyamachi, JP (1998)
  • Ibaragi-ken, JP (1998 - 2000)
  • Kitasouma-gun, JP (2000)
  • Ibaraki-ken, JP (1999 - 2001)
  • Saitama-ken, JP (2002)
  • Mariya, JP (2003)
  • Ibaraki, JP (2003)
  • Moriya, JP (2004 - 2005)

Company Filing History:


Years Active: 1995-2005

Loading Chart...
19 patents (USPTO):Explore Patents

Title: Innovations by Shintaro Kawata: Advancing Charged-Particle-Beam Microlithography

Introduction: Shintaro Kawata, an accomplished inventor based in Moriya, Japan, has made significant contributions to the field of microlithography with a remarkable portfolio of 19 patents. His work focuses mainly on apparatus and methods that enhance efficiency and precision in charged-particle-beam microlithography systems.

Latest Patents: Among his latest patents, Kawata has developed innovative apparatus and methods for blocking highly scattered charged particles in a patterned beam within a charged-particle-beam microlithography system. This patent describes a complex projection-optical system that employs a unique cutoff-plate assembly with multiple aperture-defining plates, enhancing design capabilities and reducing unwanted scattering of particles.

Another significant contribution from Kawata includes methods for complementarily dividing pattern elements on divided stencil reticles used in charged-particle-beam microlithography. This invention allows for more efficient exposure of pattern-element portions without significantly affecting throughput. By optimizing these pattern elements based on their profiles and shapes, Kawata’s methods effectively minimize size errors during the projection onto substrates.

Career Highlights: Throughout his career, Shintaro Kawata has been associated with prominent companies in the technology sector, including Nikon Corporation. His innovative work has not only advanced the capabilities of microlithography but has also cemented his status as a leading figure in the field.

Collaborations: Kawata has worked alongside talented colleagues, notably Mamoru Nakasuji and Keitaro Hara. Their combined efforts and expertise have contributed to the development of numerous advancements in microlithography practices.

Conclusion: Shintaro Kawata’s inventive spirit and dedication to advancing technology in the aviation sector have led to groundbreaking patents that improve microlithography techniques. Through his work, he continues to shape the future of charged-particle-beam applications, paving the way for new innovations and improvements in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…