The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2002
Filed:
Apr. 03, 2000
Applicant:
Inventor:
Shintaro Kawata, Saitama-ken, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ;
Abstract
Reticles are provided for use in charged-particle-beam (CPB) microlithography, especially electron-beam microlithography. The reticle is configured as a segmented reticle of which the overall reticle size is reduced without compromising projection or stitching accuracy. A representative reticle includes a membrane that defines a pattern to be projection-transferred to a sensitive substrate, and support. struts that divide the membrane into multiple rectangular regions. Each rectangular region includes multiple subfields arranged longitudinally with intervening non-patterned regions. The width of the non-patterned regions is within the range of 1 &mgr;m to 50 &mgr;m.