Osaka, Japan

Shinsuke Wada

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: C.uyemura Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinsuke Wada. Retrieved from https://idiyas.com/inventor/shinsuke-wada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Shinsuke Wada: Innovator in Electroless Palladium Plating Solutions

Introduction

Shinsuke Wada is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of plating solutions, particularly through his innovative work on electroless palladium plating.

Latest Patents

Wada holds a patent for an electroless palladium plating solution. This solution contains hydrazine or a salt thereof as a reducing agent, which provides excellent bath stability in the acidity to neutrality range. It also boasts long-term stability and effectively suppresses the decrease in palladium film deposition rates caused by the elution of etching resist. The patent outlines a formulation that includes a palladium compound, hydrazine or its salt, and specific compounds that enhance its effectiveness, maintaining a pH of 8 or less.

Career Highlights

Shinsuke Wada is associated with Cuyemura Co., Ltd., where he has been instrumental in advancing plating technologies. His work has not only contributed to the company's reputation but has also set new standards in the industry.

Collaborations

Wada has collaborated with notable colleagues such as Tetsuya Sasamura and Tatsushi Someya. Their combined expertise has fostered innovation and development in their respective fields.

Conclusion

Shinsuke Wada's contributions to electroless palladium plating solutions exemplify his commitment to innovation in the field. His patent reflects a significant advancement that benefits various applications in technology and manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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