Company Filing History:
Years Active: 2009-2012
Title: Shinn-Haw Huang: Innovator in Planar Light Source Technology
Introduction
Shinn-Haw Huang is a notable inventor based in Taoyuan County, Taiwan. He has made significant contributions to the field of light source technology, holding a total of 2 patents. His innovative work focuses on methods of fabricating planar light sources, which have applications in various lighting technologies.
Latest Patents
Huang's latest patents include a method of fabricating a planar light source and the planar light source itself. In his method, a first substrate is formed, followed by the creation of first electrodes that are approximately parallel to each other. Sets of first dielectric patterns are then formed on the first substrate, with each set containing at least two first striped dielectric patterns. These patterns cover the first electrodes correspondingly, and the edges of each pattern are raised in a peak shape. A phosphor layer is formed between the first striped dielectric patterns, and a second substrate is bound to the first substrate with a discharge gas injected into the discharge space. The planar light source patent describes a structure that includes a first substrate, a second substrate, a sealant, first electrodes, sets of first dielectric patterns, a phosphor layer, and a discharge gas, all working together to create an efficient light source.
Career Highlights
Shinn-Haw Huang is currently employed at Chunghwa Picture Tubes, Ltd., where he continues to develop innovative technologies in the field of display and lighting solutions. His work has been instrumental in advancing the capabilities of planar light sources, making them more efficient and effective for various applications.
Collaborations
Huang has collaborated with notable coworkers such as Yu-Heng Hsieh and Chu-Chi Ting, contributing to the development of cutting-edge technologies in their field.
Conclusion
Shinn-Haw Huang's contributions to planar light source technology exemplify his innovative spirit and dedication to advancing the field. His patents reflect a deep understanding of the complexities involved in light source fabrication, positioning him as a key figure in this area of research.