The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2012
Filed:
Aug. 24, 2009
Yu-heng Hsieh, Taipei, TW;
Chu-chi Ting, Hualien County, TW;
Shinn-haw Huang, Taoyuan County, TW;
Chang-jung Yang, Taoyuan County, TW;
Chia-hua Ai, Tainan County, TW;
Yu-Heng Hsieh, Taipei, TW;
Chu-Chi Ting, Hualien County, TW;
Shinn-Haw Huang, Taoyuan County, TW;
Chang-Jung Yang, Taoyuan County, TW;
Chia-Hua Ai, Tainan County, TW;
Chunghwa Picture Tubes, Ltd., Taoyuan, TW;
Abstract
In a method of fabricating a planar light source, a first substrate is formed at first. First electrodes approximately parallel to each other are formed on the first substrate. Sets of first dielectric patterns are formed on the first substrate. Each set of the first dielectric patterns includes at least two first striped dielectric patterns, and each of the first striped dielectric patterns covers one of the first electrodes correspondingly. The edges of the top of each first striped dielectric pattern are raised in a peak shape. A phosphor layer is formed between the first striped dielectric patterns of each set of the first dielectric patterns. A second substrate is formed. The first and second substrates are bound; meanwhile, a discharge gas is injected into the discharge space.