Location History:
- Urawa, JP (1981 - 2003)
- Saitama, JP (2011 - 2013)
Company Filing History:
Years Active: 1981-2013
Title: Shinji Okazaki: A Pioneer in Electron Beam Measurement Technology
Introduction
Shinji Okazaki, an accomplished inventor from Urawa, Japan, has made significant contributions to the field of electron beam measurement, holding an impressive total of 32 patents. His latest innovations demonstrate a strong commitment to advancing inspection technologies critical to semiconductor manufacturing.
Latest Patents
Among Okazaki's recent patents, two stand out for their innovative approaches to measurement and inspection. The first patent, titled "Electron Beam Measurement Apparatus," presents a sophisticated technique for accurately measuring the shapes and sizes of sample patterns, as well as detecting potential defects. This apparatus employs a unique method of irradiating patterns on substrates using a multi-exposure method, allowing for the classification of acquired images based on an exposure history record derived from brightness differences and pattern outlines.
The second patent, "Method and Apparatus for Inspecting Reticle," enhances the capability of evaluating the relative positions of patterns during the critical exposure phase of semiconductor manufacturing. This invention enables the inspection of two reticles used to form patterns on the same substrate layer, employing a comprehensive system that includes image acquisition, overlaying, and evaluation of the patterns' alignment. The apparatus ultimately provides a vital assessment of whether reticles require repair, based on calculated overlay accuracy.
Career Highlights
Shinji Okazaki’s career includes significant tenures at leading companies in the technology sector, including Hitachi, Ltd. and Hitachi High-Technologies Corporation. His work at these institutions not only highlights his expertise but also underscores the impact of his innovations on the industry.
Collaborations
Throughout his career, Okazaki has collaborated with notable colleagues like Tsuneo Terasawa and Yoshinori Nakayama. These partnerships have fostered a collaborative environment that has likely contributed to the remarkable research and development outcomes observed in Okazaki’s patent portfolio.
Conclusion
Shinji Okazaki's contributions to electron beam measurement technologies are a testament to his innovative spirit and technical expertise. With 32 patents to his name and a career defined by collaboration and advancement, he continues to pave the way for new developments in semiconductor manufacturing and inspection technologies. His work will undoubtedly influence future innovations in this critical field.