This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Sumitomo Heavy Industries Ion Technology Co., Ltd.. Active years: 2017-2019.
Company Filing History:
Years Active: 2017-2019
Title: The Innovations of Shinji Ebisu
Introduction
Shinji Ebisu is a notable inventor based in Ehime, Japan. He has made significant contributions to the field of ion implantation technology, holding 2 patents that showcase his expertise and innovative spirit. His work primarily focuses on improving processes related to wafer processing in semiconductor manufacturing.
Latest Patents
Ebisu's latest patents include an "Ion implantation apparatus and method for processing plurality of wafers using the same." This invention features a first conveyance mechanism and a second conveyance mechanism that work together to convey a pair of two wafers to an alignment device from a wafer container via a buffer device. After alignment, the wafers are brought into a first load lock chamber and a second load lock chamber. An intermediate conveyance mechanism is also employed to facilitate the movement of the wafers between the load lock chambers and a vacuum processing chamber. The apparatus efficiently manages the implantation process, ensuring that the wafers are stored back into the wafer container after processing.
Another significant patent is the "Ion implantation apparatus and control method for ion implantation apparatus." This invention includes a vacuum processing chamber where the ion implantation process occurs, along with one or more load lock chambers for transferring wafers in and out of the vacuum processing chamber. The design incorporates an intermediate conveyance chamber and communication mechanisms that enhance the efficiency and safety of the ion implantation process.
Career Highlights
Shinji Ebisu is currently employed at Sumitomo Heavy Industries Ion Technology Co., Ltd. His role at the company allows him to apply his innovative ideas and contribute to advancements in ion implantation technology. His patents reflect his commitment to improving semiconductor manufacturing processes.
Collaborations
Ebisu has collaborated with notable coworkers such as Tetsuya Kudo and Yoshito Fujii. Their combined expertise in the field has likely contributed to the successful development of innovative technologies and solutions.
Conclusion
Shinji Ebisu's contributions to ion implantation technology through his patents demonstrate his significant impact on the semiconductor industry. His work continues to influence advancements in wafer processing, showcasing the importance of innovation in technology.