Tokyo, Japan

Shinji Arihisa

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Asahi Kasei E-Materials Corporation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shinji Arihisa. Retrieved from https://idiyas.com/inventor/shinji-arihisa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Innovations by Shinji Arihisa

Introduction

Shinji Arihisa is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of fine pattern formation through his innovative patents. His work focuses on creating layered products that facilitate the manufacturing of intricate patterns with high aspect ratios.

Latest Patents

Arihisa holds a patent for a "Layered product for fine pattern formation and method of manufacturing layered product for fine pattern formation." This invention is designed to easily form fine patterns with minimal remaining film, enhancing the efficiency of processing objects. The layered product includes a mold with a concavo-convex structure and a second mask layer that adheres to specific dimensional formulas, ensuring precision in pattern formation.

Career Highlights

Throughout his career, Shinji Arihisa has worked with prominent companies, including Asahi Kasei E-materials Corporation and Asahi Kasei Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in the field of material sciences and manufacturing processes.

Collaborations

Arihisa has collaborated with notable colleagues such as Jun Koike and Fujito Yamaguchi. These partnerships have likely enriched his work and led to further advancements in his innovative projects.

Conclusion

Shinji Arihisa's contributions to the field of fine pattern formation demonstrate his commitment to innovation and excellence. His patent reflects a significant advancement in manufacturing techniques, showcasing his role as a leading inventor in this specialized area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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