The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2016
Filed:
Jun. 18, 2012
Jun Koike, Tokyo, JP;
Fujito Yamaguchi, Tokyo, JP;
Masatoshi Maeda, Tokyo, JP;
Shinji Arihisa, Tokyo, JP;
Masayoshi Arihisa, Tokyo, JP;
Jun Koike, Tokyo, JP;
Fujito Yamaguchi, Tokyo, JP;
Masatoshi Maeda, Tokyo, JP;
Shinji Arihisa, Tokyo, JP;
ASAHI KASEI E-MATERIALS CORPORATION, Tokyo, JP;
Abstract
Disclosed is a layered product for fine pattern formation and a method of manufacturing the layered product for fine pattern formation, capable of easily forming a fine pattern having a thin or no remaining film in order to form a fine pattern having a high aspect ratio on a processing object. The layered product for fine pattern formation (1) of the present invention used to form a fine pattern () in a processing object () using a first mask layer () includes: a mold () having a concavo-convex structure () on a surface; and a second mask layer () provided on the concavo-convex structure (), wherein in the second mask layer (), a distance (lcc) and a height (h) of the concavo-convex structure () satisfy Formula (1) 0<lcc<1.0 h, and a distance (lcv) and the height (h) satisfy Formula (2) 0≦lcv≦0.05 h.