Shinichiro Takasu

Title: Innovations of Shinichiro Takasu

Introduction

Shinichiro Takasu is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of silicon wafer technology, holding a total of six patents. His work focuses on methods for measuring various characteristics of silicon wafers, which are crucial in semiconductor manufacturing.

Latest Patents

One of his latest patents is a method for measuring substitutional carbon concentration in silicon wafers. This method involves several steps, including measuring light transmission characteristics of both pulled and floating zone silicon wafers using parallel polarized light at the Brewster angle. The process culminates in calculating the substitutional carbon concentration and determining if the wafer is defective based on a reference value.

Another notable patent is a method for measuring interstitial oxygen concentration in silicon wafers. This invention also utilizes light transmission characteristics measured at the Brewster angle to calculate the interstitial oxygen concentration of pulled silicon wafers. The results are then compared with a reference value to identify defects in the wafers.

Career Highlights

Shinichiro Takasu has worked with notable companies such as Tokyo Shibaura Denki Kabushiki Kaisha and VLSI Technology Research Association. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Throughout his career, Takasu has collaborated with esteemed colleagues, including Hiroshi Shirai and Mikio Watanabe. Their joint efforts have further advanced the field of silicon wafer technology.

Conclusion

Shinichiro Takasu's innovative methods for measuring characteristics of silicon wafers have made a significant impact in the semiconductor industry. His contributions continue to influence advancements in technology and manufacturing processes.