Shinichiro Miki

Title: Innovations of Shinichiro Miki

Introduction

Shinichiro Miki is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of silicon wafer manufacturing and crystal growth methods. With a total of two patents to his name, Miki's work has advanced the technology used in semiconductor production.

Latest Patents

Miki's latest patents include a manufacturing method of silicon wafers and a crystal growth method. The manufacturing method involves heat-treating an active layer side silicon wafer in an oxidizing atmosphere to form a buried oxide film. This film is crucial for fabricating an SOI wafer by bonding the active layer side silicon wafer to a supporting side wafer. The oxidizing heat treatment is conducted under specific conditions to ensure optimal results. His second patent focuses on a cooling member used in the CZ process for single crystal growth. This method effectively increases the pulling speed while preventing cracks in the single crystal due to excessive cooling. The design of the cooling member is critical, with specific temperature and thickness requirements to maintain high crystal quality.

Career Highlights

Miki has established himself as a key figure in the semiconductor industry through his innovative approaches. His work at Sumitomo Mitsubishi Silicon Corporation has allowed him to apply his research and patents in practical applications, contributing to advancements in silicon wafer technology.

Collaborations

Miki has collaborated with esteemed colleagues such as Shigeru Umeno and Masataka Hourai. Their combined expertise has fostered a productive environment for innovation and development in their field.

Conclusion

Shinichiro Miki's contributions to silicon wafer manufacturing and crystal growth methods highlight his importance as an inventor. His patents reflect a commitment to advancing technology in the semiconductor industry.