Shinichi Tanimoto

Title: The Innovative Contributions of Shinichi Tanimoto

Introduction

Shinichi Tanimoto is a prominent inventor based in Bisai, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on enhancing the reliability and efficiency of semiconductor devices, which are crucial for modern electronics.

Latest Patents

Tanimoto's latest patents include a semiconductor device and a fabrication method that significantly improve reliability and suitability for microminiaturization. One of his notable inventions involves forming an organic SOG film on a silicon oxide film, where boron ions are implanted to decompose organic components and reduce moisture and hydroxyl groups. This innovative approach leads to the creation of a modified SOG film, which is essential for embedding metal interconnections using the Damascene method. Another patent describes a semiconductor device that features a semiconductor substrate and a wiring layer doped with impurities to decrease resistivity. This design includes upper and lower wiring layers insulated by an electric insulating film, ensuring efficient electrical connections.

Career Highlights

Shinichi Tanimoto is associated with Sanyo Electric Co., Ltd., where he has been instrumental in advancing semiconductor technologies. His expertise and innovative mindset have positioned him as a key figure in the development of reliable semiconductor devices.

Collaborations

Tanimoto has collaborated with notable coworkers, including Yasunori Inoue and Yoshikazu Ibara. Their combined efforts have contributed to the success of various projects within the semiconductor field.

Conclusion

Shinichi Tanimoto's contributions to semiconductor technology exemplify his dedication to innovation and excellence. His patents reflect a deep understanding of the complexities involved in semiconductor fabrication, making him a valuable asset to the industry.