Isehara, Japan

Shinichi Nakamura



Average Co-Inventor Count = 3.7

ph-index = 27

Forward Citations = 2,595(Granted Patents)

Forward Citations (Not Self Cited) = 2,473(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Odawara, JA (1977)
  • Odawara, JP (1981)
  • Asugi, JP (1993)
  • Urawa, JP (1989 - 1994)
  • Hadano, JP (1994 - 1995)
  • Hachiouji, JP (1993 - 1996)
  • Atsugi, JP (1991 - 1997)
  • Hachioji, JP (2001 - 2003)
  • Kanagawa-ken, JP (2002 - 2003)
  • Kawasaki, JP (1987 - 2007)
  • Isehara, JP (1995 - 2010)
  • Machida, JP (2010)
  • Sagamihara, JP (2001 - 2011)
  • Hino, JP (1985 - 2013)
  • Kanagawa, JP (2005 - 2017)
  • Yokohama, JP (1981 - 2021)
  • Tokyo, JP (1983 - 2023)
  • Aichi, JP (2023)

Company Filing History:


Years Active: 1977-2023

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Areas of Expertise:
Brazing Technology
Aluminum Alloys
Heat Exchangers
Image Processing
Organic Electroluminescence
Field Effect Transistors
Endoscope Systems
Digital Filters
Semiconductor Devices
Liquid Crystal Devices
Optical Measurement
Data Processing
163 patents (USPTO):Explore Patents

Title: Shinichi Nakamura: Innovating in Aluminum Technology

Introduction:

Shinichi Nakamura, a distinguished inventor hailing from Isehara, Japan, has made remarkable contributions to the field of aluminum technology. With an impressive portfolio of 161 patents, Nakamura has been at the forefront of developing corrosion-resistant aluminum tubes and innovative display control methods. In this article, we highlight Nakamura's latest patents, explore his illustrious career, and shed light on his notable collaborations.

Latest Patents:

Among Shinichi Nakamura's recent inventions is a flat extruded aluminum multi-port tube with highly corrosion-resistant inner surfaces. This groundbreaking tube design enhances corrosion resistance within multiple independently extending flow passages. By utilizing an aluminum sacrificial anode material with a lower electrochemical potential than the aluminum tube material, a sacrificial anode portion forms in the inner circumferential portion of each flow passage. This invention holds immense potential for various industries relying on effective corrosion-resistant tubing.

Another noteworthy patent by Nakamura involves an information processing apparatus and method for display control based on magnification. This technology enables a display unit to dynamically present different operation images based on the magnification level of the displayed image. By selecting an appropriate operation image from a group of operation images, users can interact with the displayed content more efficiently. This innovation has the potential to enhance user experience in information processing systems.

Career Highlights:

Shinichi Nakamura has achieved significant milestones throughout his career. Notably, he has contributed extensively to Canon Kabushiki Kaisha (Canon Inc.) and Kabushiki Kaisha Toshiba (Toshiba Corporation). While specifics about his contributions to these companies are not provided, it is evident that Nakamura has played a vital role in their research and development efforts. His extensive patent portfolio speaks volumes about his technical expertise and inventiveness in the field of aluminum technology.

Collaborations:

Throughout his career, Shinichi Nakamura has collaborated with esteemed professionals, some of whom include Takao Takiguchi and Takeshi Togano. Their collaborative endeavors have likely resulted in further advancements and innovations within the field. Unfortunately, detailed information about their specific collaborations is not available. However, the collaborative spirit displayed by Nakamura underscores the importance of teamwork and knowledge exchange in driving forward technological innovation.

Conclusion:

Shinichi Nakamura's dedication to aluminum technology has propelled him to be one of the foremost inventors in this space. His latest patents, including the corrosion-resistant aluminum tube and display control methods, exemplify his commitment to addressing industry challenges through innovation. With his extensive patent portfolio, illustrious career with renowned companies, and notable collaborations, Nakamura has undoubtedly left an indelible mark on the field of aluminum technology. His contributions continue to shape and transform industries, paving the way for future innovations in the realm of materials science and information processing.

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