Kanagawa, Japan

Shingo Kanamitsu, Sr

This inventor holds 1 USPTO granted patent. Top assignee: Toshiba Memory Corporation. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shingo Kanamitsu, Sr. Retrieved from https://idiyas.com/inventor/shingo-kanamitsu-sr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Shingo Kanamitsu, Sr: Innovator in Template Substrate Technology.

Introduction

Shingo Kanamitsu, Sr. is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of template substrates.

Latest Patents

One of his key patents is titled "Template substrate and manufacturing method thereof." This invention describes a template substrate that features a first face and a second face on the opposite side. The first region on the first face protrudes from the peripheral portion, while the second region, located at the end of the first region, is designed to form an alignment mark used during pattern transfer. Notably, the second region contains both a first impurity and a second impurity, enhancing its functionality. Shingo Kanamitsu, Sr. holds 1 patent.

Career Highlights

Shingo Kanamitsu, Sr. is currently employed at Toshiba Memory Corporation, where he continues to innovate and contribute to advancements in memory technology. His work has been instrumental in improving the efficiency and effectiveness of template substrates in various applications.

Collaborations

He has collaborated with Masamitsu Ito, a fellow innovator, to further enhance the development of their technologies.

Conclusion

Shingo Kanamitsu, Sr. is a prominent figure in the field of template substrate technology, with a focus on innovative solutions that drive advancements in semiconductor manufacturing. His contributions continue to shape the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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