Toshiba Memory Corporation

Shingo Kanamitsu, Sr

Masamitsu Ito

A template substrate according to an embodiment includes a first face and a second face on an opposite side to the first face. A first region is located on the first face to be protruded from a peripheral portion thereof. A second region is located at least at an end portion of the first region, and is a region in which an alignment mark used at a time of transfer of a pattern is intended to be formed. The second region contains a first impurity and a second impurity.

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Kanagawa, Japan

Shingo Kanamitsu, Sr