Shing-Chung Wang

Title: Innovations of Shing-Chung Wang

Introduction

Shing-Chung Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on developing advanced optical devices that enhance the performance and efficiency of semiconductor applications.

Latest Patents

Wang's latest patents include a semiconductor optical device featuring an air media layer and a method for forming this layer. This innovative method involves providing a substrate, forming a GaN thin film, and creating a sacrificial layer on the thin film. The process culminates in immersing the semiconductor optical device in an acidic solution to remove part of the sacrificial layer, resulting in the formation of an air media layer. Another notable patent is for a surface-emitting laser device, which comprises a substrate, a low refractive index layer, and a light-emitting layered structure. This device is designed to generate photons with specific wavelengths and incorporates a two-dimensional photonic crystal with optical nanostructures arranged in a periodic pattern.

Career Highlights

Throughout his career, Shing-Chung Wang has worked with esteemed organizations such as National Yang Ming Chiao Tung University and Lite-On Technology Corporation. His experience in these institutions has allowed him to collaborate on various innovative projects and contribute to advancements in semiconductor technology.

Collaborations

Wang has collaborated with notable colleagues, including Tien-Chang Lu and Hao-Chung Kuo. Their combined expertise has fostered a productive environment for research and development in the field of optical devices.

Conclusion

Shing-Chung Wang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to shape the future of optical devices in the industry.