Hsinchu, Taiwan

Shing-Ann Lo


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: **Shing-Ann Lo: Innovator in Dielectric Layer Technology**

Introduction

Shing-Ann Lo is a prominent inventor based in Hsinchu, Taiwan, known for his contributions to the field of semiconductor technology. With a focus on innovative methods of forming dielectric layers, Lo has made significant strides in enhancing the performance and efficiency of electronic devices.

Latest Patents

Shing-Ann Lo holds a patent for a method of forming a dielectric layer. This ingenious approach involves creating a first dielectric layer on a substrate that has metal layers formed thereon. The method includes the formation of overhangs in the spaces between neighboring metal layers and voids located underneath these overhangs. To optimize the structure, the first dielectric layer is partially removed, resulting in the exposure of voids and the creation of openings. This comprehensive process is followed by the application of a second dielectric layer, which fills the openings, ensuring a robust and efficient dielectric structure for electronic applications.

Career Highlights

As an inventor working with Macronix International Co., Ltd., Shing-Ann Lo has dedicated his career to advancing semiconductor technologies. His work not only exemplifies technical expertise but also demonstrates an understanding of the intricacies involved in the innovation process within the electronics industry.

Collaborations

Throughout his career, Shing-Ann Lo has collaborated with talented colleagues, including Hsu-Sheng Yu and Ta-Hung Yang. Together, they contribute to the dynamic environment at Macronix International Co., Ltd., fostering a culture of innovation and excellence in semiconductor research and development.

Conclusion

Shing-Ann Lo's inventive approach to dielectric layer technology highlights the importance of ongoing innovation in the semiconductor field. His contributions, particularly through his patent, showcase a commitment to enhancing the efficacy of electronic devices, which is vital for the future of technology. With continued collaboration and dedication, Lo and his team at Macronix International Co., Ltd. are poised to make even more impactful advancements.

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