Hsinchu, Taiwan

ShinAn Ku

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2023-2025

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5 patents (USPTO):Explore Patents

Title: Innovations of ShinAn Ku in Particle Inspection Technologies

Introduction

ShinAn Ku is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of particle inspection technologies, holding a total of 5 patents. His work focuses on enhancing the accuracy and efficiency of inspection methods used in semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "High throughput and high position accurate method for particle inspection of mask pods." This innovative method involves moving a stage that holds a mask pod, stopping at various locations under the outer surface for a predefined duration. At each location, a stream of air is directed to the surface, and an image of the scattered air is captured. This process allows for the determination of the number of particles present, ultimately generating a detailed map of particles on the mask pod's surface.

Another notable patent is the "Method of fast surface particle and scratch detection for EUV mask backside." This method utilizes a converging beam of light with multiple wavelengths to scan a substrate. Each wavelength focuses at different distances around the substrate's surface, allowing for the detection of scratches and surface irregularities based on the intensity of the reflected light.

Career Highlights

ShinAn Ku is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing inspection technologies that are critical for maintaining the quality and reliability of semiconductor products.

Collaborations

He has collaborated with notable colleagues, including Ting-Hao Hsu and Hsin-Chang Lee, contributing to various projects that enhance the capabilities of particle inspection methods.

Conclusion

ShinAn Ku's innovative approaches to particle inspection have significantly impacted the semiconductor manufacturing industry. His patents reflect a commitment to improving inspection accuracy and efficiency, ensuring high-quality standards in semiconductor production.

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