This inventor holds 1 USPTO granted patent. Top assignees: Daito Chemix Corporation, Tokyo Ohka Kogyo Co., Ltd.. Active years: 1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 7 
1 out of 1,236 Years Active: 1999
Title: **Shin-ya Kuramoto: Innovator in Chemical-Sensitization Photoresist Composition**
Introduction
Shin-ya Kuramoto, based in Minoh, Japan, is a notable inventor recognized for his work in the field of photoresist compositions. His innovative approach has led to advancements in the contrast, resolution, and stability of patterned resist layers in photolithography, which is critical for semiconductor manufacturing.
Latest Patents
Kuramoto holds a patent for a chemical-sensitization photoresist composition. This invention proposes a novel positive- or negative-working photoresist composition that exhibits significant improvements in contrast and resolution during patterning processes. It enhances photo-sensitivity and maintains a stable latent image after exposure to light prior to post-exposure baking treatment. The composition consists of 100 parts by weight of a film-forming resinous ingredient and 0.5 to 20 parts by weight of a radiation-sensitive acid-generating agent, specifically a diazomethane compound.
Career Highlights
Throughout his career, Shin-ya Kuramoto has contributed to the technological advancements in photoresist materials through his work at leading companies such as Tokyo Ohka Kogyo Co., Ltd. and Daito Chemix Corporation. His expertise in developing high-performance materials has made a substantial impact on the production processes within the electronics industry.
Collaborations
While working in the industry, Kuramoto collaborated with notable colleagues, including Kazuyuki Nitta and Kazufumi Sato. These collaborations have further advanced research and development in chemical-sensitized photoresist technologies, enhancing both innovation and implementation strategies in practical applications.
Conclusion
Shin-ya Kuramoto exemplifies the spirit of innovation through his contributions to chemical-sensitization photoresist compositions. His work has not only secured a patent but has also laid the foundation for further advancements in the semiconductor industry, demonstrating the importance of collaboration and expertise in fostering technological growth.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile