Shin-ya Fujimoto

Title: Innovations of Shin-ya Fujimoto in Organic Semiconductors

Introduction

Shin-ya Fujimoto is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of organic semiconductors, holding a total of four patents. His work focuses on methods for manufacturing organic semiconductor elements that enhance performance and efficiency.

Latest Patents

Fujimoto's latest patents include innovative methods for manufacturing organic semiconductor elements. One notable patent describes a method that allows for the easy patterning of an organic semiconductor layer without compromising its mobility. This process involves several steps, including the formation of source and drain electrodes, the creation of an organic semiconductor layer using liquid crystal organic semiconductor material, and the application of a dielectric layer. Another patent outlines a similar method that simplifies the process of obtaining a patterned organic semiconductor layer while maintaining high mobility. This method includes the formation of a first dielectric layer and a second dielectric layer that interacts with the organic semiconductor layer.

Career Highlights

Fujimoto is associated with Dai Nippon Printing Co., Ltd., where he continues to advance the field of organic semiconductors. His innovative approaches have positioned him as a key figure in the development of new technologies in this area.

Collaborations

Fujimoto has collaborated with notable colleagues, including Ken Tomino and Shigehiro Ueno. Their combined expertise contributes to the ongoing advancements in organic semiconductor technology.

Conclusion

Shin-ya Fujimoto's work in organic semiconductors exemplifies innovation and dedication to improving manufacturing processes. His patents reflect a commitment to enhancing the performance of organic semiconductor elements, making significant strides in the field.