This inventor holds 3 USPTO granted patents. Top assignee: Advanced Micro Devices Corporation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: The Innovations of Shin Fujieda
Introduction
Shin Fujieda is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of material rendering through his innovative patent. His work is particularly relevant in the context of modern graphics and rendering technologies.
Latest Patents
Fujieda holds a patent for a method titled "Progressive Material Caching." This invention involves minimal preprocessing of trees of materials in textures. The approach progressively caches outputs of certain material nodes evaluated during scene rendering. A node may serve as the root of a subtree, generating a texel value based on other nodes' values in the subtree. The subtree of a cacheable node contains no shading-point dependent node as a descendant, except for texture coordinates. When evaluating materials for rendering, a descriptor of the node acts as a key to store or reuse the texel value in a materials cache in memory. By defining cacheable nodes at the highest possible levels in a tree, repeated evaluations of most nodes are avoided. For multithreaded acceleration, the materials cache is designed for thread-safe operation using atomic instructions. This patent showcases Fujieda's innovative approach to enhancing rendering efficiency.
Career Highlights
Shin Fujieda is currently employed at Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His work at AMD allows him to apply his inventive ideas in a practical setting, contributing to advancements in technology.
Collaborations
Fujieda collaborates with Takahiro Harada, a fellow innovator in the field. Their partnership fosters a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Shin Fujieda's contributions to material rendering through his patent on Progressive Material Caching highlight his innovative spirit and technical expertise. His work continues to influence advancements in graphics technology, making a significant impact in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile