The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Jun. 30, 2023
Applicant:

Advanced Micro Devices, Inc., Santa Clara, CA (US);

Inventors:

Shin Fujieda, Tokyo, JP;

Takahiro Harada, Santa Clara, CA (US);

Chih-Chen Kao, Munich, DE;

Assignee:

Advanced Micro Devices, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/06 (2011.01);
U.S. Cl.
CPC ...
G06T 15/06 (2013.01);
Abstract

A technique for performing ray tracing operations is provided. The technique includes traversing a bounding volume hierarchy for a ray to arrive at a bounding box without use of a neural network; perform a feature vector lookup using modified polar coordinates characterizing the ray relative to the bounding box to obtain a set of feature vectors; and obtaining output with the neural network using the set of feature vectors.


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Fujieda, Shin. (2026). Neural network-based ray tracing (U.S. Patent No. 12718464). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12718464

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