Shin-Chi Lu

Title: Innovations of Shin-Chi Lu in Semiconductor Technology

Introduction

Shin-Chi Lu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of SiGe epitaxial layers. His innovative methods have the potential to enhance the performance of semiconductors, making them more efficient and reliable.

Latest Patents

Shin-Chi Lu holds a patent for a method to fabricate patterned strain-relaxed SiGe epitaxial with threading dislocation density control. This method involves defining an ion-implanting area on a silicon substrate, followed by ion-implanting. Subsequently, a buffer layer and a SiGe epitaxial layer are deposited. The process allows for the definition of active and non-active areas through ion-implanting, which helps to concentrate threading dislocations in the non-active area, thereby lowering their density. This innovation not only improves the quality of the semiconductor but also enhances its overall performance.

Career Highlights

Shin-Chi Lu is associated with the Industrial Technology Research Institute, where he has been instrumental in advancing semiconductor research and development. His work has garnered attention for its practical applications in the industry, particularly in improving semiconductor manufacturing processes.

Collaborations

Shin-Chi Lu has collaborated with notable colleagues such as Yang-Tai Tseng and Pang-Shiu Chen. Their combined expertise has contributed to the success of various projects within the semiconductor field.

Conclusion

Shin-Chi Lu's innovative methods in semiconductor technology exemplify the importance of research and development in enhancing electronic components. His contributions continue to influence the industry positively, paving the way for future advancements.