Industrial Technology Research Institute

Shin-Chi Lu

Pang-Shiu Chen

Yang-Tai Tseng

A method to fabricate patterned strain-relaxed SiGe epitaxial with threading dislocation density control is provided. An ion-implanting area is first defined on a silicon substrate, and then proceeds ion-implanting. Finally, a buffer layer and a SiGe epitaxial layer are deposited. According to the disclosure, an active area and a non-active area are defined through ion-implanting. Therefore, the threading dislocation occurring in the active area concentrates in the non-active area, and the density of the threading dislocation is lowered. Furthermore, the performance of the semiconductor is also enhanced.

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Shin-Chi Lu