Kiryat Tivon, Israel

Shimon Halevi

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials Israel Limited. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shimon Halevi. Retrieved from https://idiyas.com/inventor/shimon-halevi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Shimon Halevi: Innovator in Pattern Measurement Technology

Introduction

Shimon Halevi is a notable inventor based in Kiryat Tivon, Israel. He has made significant contributions to the field of pattern measurement technology. His innovative approach has led to the development of a unique patent that enhances the accuracy of pattern analysis.

Latest Patents

Halevi holds a patent for a method, a non-transitory computer readable medium, and a system for measuring a pattern. The patent outlines a process that includes obtaining an electron image of a sample area, generating a converted image through noise reduction, and analyzing the converted image for pattern measurement. This method is crucial for improving the precision of measurements in various applications.

Career Highlights

Shimon Halevi is currently employed at Applied Materials Israel Limited, where he continues to work on advancing technologies related to his patent. His expertise in the field has positioned him as a valuable asset to his company and the industry at large.

Collaborations

Halevi collaborates with talented colleagues, including Utkarsh Rawat and Vladislav Kaplan. Their combined efforts contribute to the innovative environment at Applied Materials Israel Limited.

Conclusion

Shimon Halevi's work in pattern measurement technology exemplifies the impact of innovation in the field. His patent and ongoing contributions continue to shape advancements in measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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