Hockessin, DE, United States of America

Shijing Xia

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023-2025

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2 patents (USPTO):Explore Patents

Title: **Shijing Xia: Innovator in Chemical Mechanical Polishing Technology**

Introduction

Shijing Xia, an inventive mind based in Hockessin, DE, has made significant contributions to the field of chemical mechanical polishing. With a total of two patents to his name, his work has been pivotal in advancing the technology used in the polishing layers of various materials.

Latest Patents

Shijing Xia's latest patents focus on the development of a chemical mechanical polishing pad and its preparation. The first patent describes a chemical mechanical polishing pad that features a polishing layer made from an extruded sheet. This extruded sheet is composed of a photopolymerizable composition, which includes a block copolymer, a UV curable acrylate, and a photoinitiator. The second patent similarly outlines a polishing pad wherein the extruded sheet is prepared by extruding a compounded photopolymerizable composition and subsequently exposing it to UV light. These innovations underscore Xia's expertise in materials science and engineering, enabling improvements in the efficiency and effectiveness of polishing processes.

Career Highlights

Throughout his career, Shijing Xia has held positions at notable companies such as Rohm and Haas Electronic Materials CMP Holdings, Inc. and DuPont Electronics, Inc. His work in these esteemed organizations has allowed him to apply his innovative ideas effectively within the industry.

Collaborations

In his professional journey, Shijing Xia has collaborated with talented individuals, including coworkers Bainian Qian and Robert M. Blomquist. These partnerships have contributed to his research and development efforts, enhancing the potential applications of his inventions.

Conclusion

Shijing Xia stands out as an influential inventor whose work in chemical mechanical polishing technology continues to impact the industry. His patents not only reflect his technical prowess but also highlight the collaborative nature of innovation in advancing material science. As he moves forward, his contributions are likely to inspire further advancements in polishing technologies.

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