Shih-Yung Shieh

Title: Innovations by Inventor Shih-Yung Shieh

Introduction

Shih-Yung Shieh is a talented inventor based in Hsinchu, Taiwan. She has made significant contributions to the field of semiconductor manufacturing and film deposition technologies. With a total of three patents to her name, Shieh has displayed her innovative prowess, particularly in the development of advanced apparatuses that improve efficiency and performance in manufacturing processes.

Latest Patents

Her latest patents include the "Vapor Phase Film Deposition Apparatus," which features a susceptor designed to hold multiple substrates. The apparatus incorporates an opposing face member with raised portions that create defined flow channels for reaction gases. This design enhances the deposition of materials on the substrates while incorporating heat insulation structures to optimize temperature management.

Another notable patent is the "Gas Injector for Semiconductor Processes and Film Deposition Apparatus." This invention consists of a sophisticated gas injector that involves multiple gas inlets and outlets. It is capable of introducing various gases efficiently into the deposition process, with a unique design that gradually changes the flow dynamics of gases through the system, ensuring optimal performance in semiconductor fabrication.

Career Highlights

Shih-Yung Shieh currently works at Hermes-Epitek Corporation, where she leverages her expertise in materials and engineering to drive innovation within the company. Her commitment to advancing semiconductor technology has positioned her as a key player in her field. The impact of her patents not only contributes to her company's growth but also supports the wider semiconductor industry by enhancing production techniques.

Collaborations

Shieh has collaborated with esteemed colleagues such as Noboru Suda and Junji Komeno, fostering a creative environment that encourages the exchange of ideas and results in groundbreaking innovations. Their combined expertise contributes significantly to the development of cutting-edge solutions in semiconductor processes.

Conclusion

In conclusion, Shih-Yung Shieh is an exemplary inventor whose work continues to influence the semiconductor industry. Through her innovative patents and collaboration with her colleagues at Hermes-Epitek Corporation, she demonstrates a commitment to pushing the boundaries of technology and enhancing manufacturing processes. Her contributions serve as an inspiration for future inventors in the field.