The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2020
Filed:
May. 09, 2017
Applicant:
Hermes-epitek Corporation, Taipei, TW;
Inventor:
Shih-Yung Shieh, Taipei, TW;
Assignee:
HERMES-EPITEK CORPORATION, Taipei, TW;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/22 (2006.01); C23C 16/448 (2006.01); C23F 1/12 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01); F28F 13/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45548 (2013.01); C23C 16/22 (2013.01); C23C 16/448 (2013.01); C23C 16/4584 (2013.01); C23C 16/45563 (2013.01); C23C 16/45576 (2013.01); C23F 1/12 (2013.01); H01L 21/02312 (2013.01); H01L 21/306 (2013.01); F28F 13/003 (2013.01);
Abstract
A gas injector is used in a film deposition apparatus for semiconductor processes. The gas injector comprises a plurality of gas inlets, a plurality of gas flow channels, and a plurality of gas outlets. The gas inlets introduce several kinds of gases into the gas flow channels. The several kinds of gases are delivered to the gas outlets by the gas flow channels. The cross-sectional area of a portion of at least one of the gas flow channels is gradually changed relative to the gas outlets.