Shih-Wei Yeh

Title: Shih-Wei Yeh: Innovator in Semiconductor Fabrication

Introduction

Shih-Wei Yeh is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor fabrication, particularly through his innovative methods. His work has implications for the efficiency and effectiveness of contact structures in electronic devices.

Latest Patents

Shih-Wei Yeh holds 1 patent for a method of fabricating a contact structure. This patent outlines a process that includes forming an opening in a dielectric layer and creating a conductive material layer within that opening. The method specifies that the conductive material layer consists of a bottom section with a first thickness and a top section with a second thickness, where the second thickness exceeds the first. The process involves treatments to form an oxide layer and subsequently remove portions of both the oxide layer and the conductive material layer, resulting in equal thickness for both sections.

Career Highlights

Shih-Wei Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His role at the company allows him to apply his innovative ideas in a practical setting, contributing to advancements in technology.

Collaborations

Shih-Wei Yeh has collaborated with notable colleagues, including Chang-Ting Chung and Kai-Chieh Yang. These partnerships have fostered a creative environment that encourages the development of new technologies and methodologies in semiconductor fabrication.

Conclusion

Shih-Wei Yeh's contributions to the field of semiconductor fabrication highlight his innovative spirit and dedication to advancing technology. His patent for a method of fabricating contact structures exemplifies the importance of innovation in the semiconductor industry.