Shih-Mou Chang

Title: Shih-Mou Chang: Innovator in Semiconductor Technology

Introduction

Shih-Mou Chang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to device manufacturing.

Latest Patents

One of his latest patents is focused on a semiconductor device and manufacturing method designed to protect metal gates from oxidation. This invention involves providing a substrate for the semiconductor device with a gate structure and a first dielectric interlayer formed thereon. The gate structure comprises a metal gate, and the upper surface of the first dielectric interlayer is substantially flush with the upper surface of the gate. The method includes forming an interface layer to cover at least the upper surface of the gate, ensuring that it is protected from oxidation, followed by the formation of a second dielectric interlayer on the interface layer.

Career Highlights

Shih-Mou Chang is currently employed at Semiconductor Manufacturing International Corporation in Beijing. His work at this leading semiconductor company has allowed him to develop and refine his innovative ideas in the industry.

Collaborations

He collaborates with talented individuals such as Xinpeng Wang and Yi Huang, who contribute to the dynamic environment of innovation at their workplace.

Conclusion

Shih-Mou Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing.