Shih Ju Huang

Title: Shih Ju Huang: Innovator in Photomask Technology

Introduction

Shih Ju Huang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of photomask technology, which is crucial in the semiconductor manufacturing process. His innovative work has led to the development of a unique patent that enhances the precision of photomask measurements.

Latest Patents

Shih Ju Huang holds a patent for a "Photomask and methods for measuring and manufacturing the photomask." This patent describes a method that includes forming a test pattern and a reference pattern in an absorption layer of a photomask structure. The test pattern features a first trench and a second trench, while the reference pattern includes a third trench and a fourth trench. Notably, the second trench is deeper than the first trench, the third trench, and the fourth trench. The method further involves emitting a light beam to the test pattern to obtain a first interference pattern and to the reference pattern to obtain a second interference pattern. By comparing these two interference patterns, a measured complex refractive index of the absorption layer can be obtained.

Career Highlights

Shih Ju Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company allows him to apply his innovative ideas and contribute to advancements in technology.

Collaborations

One of his notable collaborators is Chien-Cheng Chen, with whom he has worked on various projects related to photomask technology.

Conclusion

Shih Ju Huang's contributions to photomask technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the semiconductor field. His innovative methods continue to impact the industry positively.