Shih-Feng Su

Title: Innovations of Shih-Feng Su in Semiconductor Technology

Introduction

Shih-Feng Su is a notable inventor based in Kaohsiung City, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of cleaning processes. His innovative approach has led to the development of a unique patent that enhances the efficiency of semiconductor manufacturing.

Latest Patents

Shih-Feng Su holds a patent for a semiconductor cleaning step. This invention provides a comprehensive method that includes several key steps. It involves providing a chamber with a bottom surface and a sidewall, where a heater is located on the bottom surface. The process begins with a first deposition step that leaves a residual layer on the sidewall of the chamber. Following this, a carbon deposition step is performed to form a carbon layer on at least the surface of the heater. Finally, a plasma cleaning step is executed to simultaneously remove both the residual layer on the sidewall and the carbon layer on the bottom surface. This innovative cleaning method is crucial for maintaining the integrity and performance of semiconductor devices.

Career Highlights

Shih-Feng Su is currently employed at United Semiconductor (Xiamen) Co., Ltd. His work at this company has allowed him to apply his expertise in semiconductor technology and contribute to advancements in the industry. With a focus on improving cleaning processes, Su's innovations are paving the way for more efficient semiconductor manufacturing.

Collaborations

Shih-Feng Su collaborates with talented individuals in his field, including William Zheng and Chih-Chien Huang. These partnerships enhance the development of innovative solutions in semiconductor technology.

Conclusion

Shih-Feng Su's contributions to semiconductor technology through his innovative cleaning processes demonstrate his commitment to advancing the industry. His patent reflects a significant step forward in improving manufacturing efficiency.