Hsinchu, Taiwan

Shih-Ci Yen

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Powerchip Semiconductor Manufacturing Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shih-Ci Yen. Retrieved from https://idiyas.com/inventor/shih-ci-yen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Shih-Ci Yen: Innovator in Semiconductor Manufacturing

Introduction

Shih-Ci Yen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing. His innovative approach has led to the development of a unique patent that enhances manufacturing processes.

Latest Patents

Shih-Ci Yen holds a patent titled "Method of manufacturing mark." This patent outlines a method that includes several steps for creating a mark on a substrate. The process involves forming a dielectric layer on the substrate, creating dual damascene openings, and sealing a third opening with a barrier material layer. This innovative method improves the efficiency and effectiveness of semiconductor manufacturing.

Career Highlights

Yen is associated with Powerchip Semiconductor Manufacturing Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the company's manufacturing capabilities. With a focus on innovation, he continues to contribute to the field.

Collaborations

Shih-Ci Yen has collaborated with notable colleagues, including Hsiao-Chiang Lin and Chia-Kuang Lee. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Shih-Ci Yen's contributions to semiconductor manufacturing through his patent and collaborative efforts highlight his role as an innovator in the industry. His work continues to influence advancements in technology and manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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