Katsuradaiminami, Japan

Shih-Chung Lee

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Macronix International Co., Ltd.. Active years: 2023-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shih-Chung Lee. Retrieved from https://idiyas.com/inventor/shih-chung-lee-xeare0gu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 1


Company Filing History:


Years Active: 2023-2025

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Shih-Chung Lee: Innovator in Memory Device Technology

Introduction

Shih-Chung Lee is a notable inventor based in Katsuradaiminami, Japan. He has made significant contributions to the field of memory devices, holding two patents that showcase his innovative approach to technology.

Latest Patents

Lee's latest patents include an operation method for a memory device and an error detection method for memory devices. The operation method involves selecting a word line from multiple options and applying specific voltages to enhance performance. The error detection method outlines a systematic approach to identifying errors in memory cells, ensuring reliability in memory operations.

Career Highlights

Shih-Chung Lee is associated with Macronix International Co., Ltd., where he continues to develop cutting-edge memory technologies. His work has been instrumental in advancing the capabilities of memory devices, making them more efficient and reliable.

Collaborations

Lee collaborates with Chi-Yuan Chin, a talented woman in the field, contributing to the innovative projects at Macronix International Co., Ltd. Their teamwork exemplifies the importance of collaboration in driving technological advancements.

Conclusion

Shih-Chung Lee's contributions to memory device technology highlight his role as an influential inventor. His patents reflect a commitment to innovation and excellence in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…