Location History:
- Yonghe, TW (2014)
- New Taipei, TW (2015)
- Taipei, TW (2006 - 2022)
Company Filing History:
3 out of 9,157 
1 out of 293 Years Active: 2006-2022
Title: Shih-Chin Lin: Innovator in Flow Field Visualization and Thin Film Deposition
Introduction
Shih-Chin Lin is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the fields of flow field visualization and thin film deposition. With a total of 4 patents, Lin's work showcases his innovative approach to solving complex engineering challenges.
Latest Patents
One of Lin's latest patents is a visualization device and observation method for flow fields. This device includes a chamber, a power supply, at least one pair of electrodes, and a flow field observation module. The observation module features a high-speed camera, a light detecting component, and a light filter component. The power supply generates plasma, while the electrodes are positioned within the chamber. The observation module captures images of fluid particles excited by the plasma, providing valuable insights into flow dynamics.
Another notable patent is a multi-mode thin film deposition apparatus and method. This apparatus consists of a reaction chamber, a carrying seat, a showerhead, and both a first and second gas inflow system. The design allows for the supply of different process gases during various thin film deposition modes, enhancing the versatility and efficiency of the deposition process.
Career Highlights
Throughout his career, Shih-Chin Lin has worked with esteemed organizations such as the Industrial Technology Research Institute and Silicon Integrated Systems Corporation. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking advancements in technology.
Collaborations
Lin has collaborated with notable colleagues, including Ching-Chiun Wang and Chih-Yung Huang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Shih-Chin Lin's contributions to the fields of flow field visualization and thin film deposition highlight his role as a leading inventor. His innovative patents and collaborative efforts continue to influence advancements in technology.