Company Filing History:
Years Active: 2018-2022
Title: Shih-Chieh Teng: Innovator in Atomic Layer Deposition Technologies
Introduction
Shih-Chieh Teng is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of materials science, particularly in the optimization of atomic layer deposition techniques. With a total of 2 patents to his name, Teng's work is paving the way for advancements in semiconductor technology.
Latest Patents
Teng's latest patents include a method to optimize atomic layer deposition. This innovative method involves several steps, starting with the provision of a cellulose nanofiber, followed by an acidifying treatment to enhance its properties. The process continues with hydrophobing the cellulose nanofiber, dissolving it in a solvent, and coating it onto a silicone resin film. The final steps involve heating the coated film to form a cellulose nanofiber layer and subsequently forming an inorganic coating layer through atomic layer deposition. Another significant patent focuses on a silicone resin film that includes a release substrate and a silicone resin coating layer, which is crucial for optical semiconductor devices.
Career Highlights
Shih-Chieh Teng is currently associated with Benq Materials Corporation, where he continues to innovate and develop new technologies. His work is instrumental in enhancing the performance and efficiency of materials used in various applications, particularly in the electronics sector.
Collaborations
Teng collaborates with Ju-Hui Huang, a talented woman in the field, contributing to the advancement of their shared projects and research initiatives.
Conclusion
Shih-Chieh Teng's contributions to atomic layer deposition and materials science are noteworthy. His innovative patents and ongoing work at Benq Materials Corporation highlight his role as a leading inventor in the industry.