Benq Materials Corporation

Shih-Chieh Teng

Ju-Hui Huang

The disclosure provides a method to optimize atomic layer deposition comprising the following steps: (A) providing a cellulose nanofiber; (B) acidifying the cellulose nanofiber by an acidifying treatment agent; (C) hydrophobing the acidified cellulose nanofiber by a hydrophobinghydrophobic treatment agent; (D) dissolving the acidified and hydrophobed cellulose nanofiber in a solvent to form a cellulose nanofiber solution; (E) coating the cellulose nanofiber solution on a silicone resin film; (F) heating the coated silicone resin film to form a cellulose nanofiber layer on a surface of the silicone resin film; and (G) forming an inorganic coating layer on the surface of the silicone resin film having the cellulose nanofiber layer by atomic layer deposition.

Method to optimize atomic layer deposition

The disclosure provides a silicone resin film comprising a release substrate and a silicone resin coating layer formed by coating a curable silicone resin composition on the release substrate and curing the curable silicon resin composition, wherein the silicone resin composition comprises 10 to 25 parts by weight of linear polysiloxane; 40 to 55 parts by weight of a first silicone resin wherein the first silicone resin have at least following siloxane units represented by the general formulas: RSiOand a RSiO, wherein the molar fraction of RSiOunit is present in the range of 0.60 to 0.75 in the general formula; 15 to 30 parts by weight of a second silicone resin; 15 to 25 parts by weight of a Si&#x2014;H containing polysiloxane; a platinum group metal catalyst and phosphor powder.

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Taoyuan, Taiwan

Shih-Chieh Teng