Hsinchu, Taiwan

Shih-Chieh Kao


Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 24(Granted Patents)


Location History:

  • Taipei Hsien, TW (2000)
  • Hsinchu, TW (2002 - 2003)

Company Filing History:


Years Active: 2000-2003

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4 patents (USPTO):Explore Patents

Title: Innovations of Shih-Chieh Kao

Introduction

Shih-Chieh Kao is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on enhancing the integrity and reliability of gate dielectrics and improving the design of via plug structures.

Latest Patents

One of his latest patents is a method for determining the integrity of a gate dielectric. This innovative approach involves a one-step programmed VRDB test using a Vcc voltage power source. The method records gate current density for corresponding ramped voltages. If the gate current density exceeds a specified criterion, the gate oxide is deemed defective. Conversely, if the current density is below the criterion, a differential gate current density ratio is calculated to assess the robustness of the gate dielectric.

Another significant patent involves a via plug layout structure for connecting different metallic layers. This design features a fan-shaped arrangement of via plugs, with empty bars positioned to ensure equal current distribution. This structure helps identify via plugs that may face serious electromigration issues. Additionally, it allows for the fabrication of single via plugs with varying critical dimensions, determining the maximum sustainable critical dimension after electromigration testing.

Career Highlights

Shih-Chieh Kao is currently employed at United Microelectronics Corporation, a leading semiconductor foundry. His work at this company has been instrumental in advancing semiconductor manufacturing processes and technologies.

Collaborations

Throughout his career, Shih-Chieh has collaborated with notable colleagues, including Mu-Chun Wang and Shih-Chung Li. These collaborations have contributed to the development of innovative solutions in the semiconductor industry.

Conclusion

Shih-Chieh Kao's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in the industry, ensuring the reliability and efficiency of semiconductor devices.

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