Shih Chan Wei

Title: Shih Chan Wei: Innovator in Integrated Circuit Technology

Introduction

Shih Chan Wei is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of integrated circuit technology, particularly through his innovative patent related to metal-insulator-metal capacitors.

Latest Patents

Shih Chan Wei holds a patent for a "Metal-insulator-metal capacitor within metallization structure." This invention involves a metallization structure of an integrated circuit (IC) that includes an intermetal dielectric (IMD) layer, a patterned metal layer embedded in the IMD layer, and a patterned top metal layer disposed on the IMD layer. The design also features electrical vias that connect the patterned top metal layer and the patterned metal layer embedded in the IMD layer. The metal-insulator-metal (MIM) capacitor consists of a first capacitor metal layer, a second capacitor metal layer, and an insulator layer positioned between them.

Career Highlights

Shih Chan Wei is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing technologies that enhance the performance and efficiency of integrated circuits.

Collaborations

Shih Chan Wei has collaborated with notable colleagues, including Chi-Han Yang and Lung-Hui Chen. These partnerships have contributed to the development of innovative solutions in the semiconductor field.

Conclusion

Shih Chan Wei's contributions to integrated circuit technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the industry. His advancements continue to influence the future of semiconductor technology.