Sapporo, Japan

Shigeyuki Iida

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2018.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Shigeyuki Iida: Innovator in Substrate Processing Technology

Introduction

Shigeyuki Iida is a notable inventor based in Sapporo, Japan. He has made significant contributions to the field of substrate processing technology. His innovative work has led to the development of a unique monitoring device that enhances the efficiency and reliability of substrate processing apparatuses.

Latest Patents

Shigeyuki Iida holds 1 patent for his invention titled "Substrate processing apparatus, monitoring device of substrate processing apparatus, and monitoring method of substrate processing apparatus." This patent discloses a monitoring device designed to oversee the state of a substrate processing process within a substrate processing apparatus. The device features an imaging unit that captures the processing state, a storage unit for data retention, and a group classification unit that categorizes moving pictures into normal and abnormal groups. Additionally, it includes a threshold generation unit that establishes a threshold for detecting abnormal moving pictures based on the normal group data.

Career Highlights

Shigeyuki Iida is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His role involves research and development, focusing on improving substrate processing technologies. His expertise and innovative mindset have positioned him as a valuable asset to the company.

Collaborations

Shigeyuki Iida collaborates with his coworker, Motoi Okada, to further enhance their research and development efforts. Together, they work on advancing technologies that contribute to the efficiency of substrate processing.

Conclusion

Shigeyuki Iida's contributions to substrate processing technology exemplify the impact of innovation in the field. His patent and ongoing work at Tokyo Electron Limited highlight his commitment to advancing technology and improving industry standards.

Profile summary based on public USPTO records.
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