Shimonoseki, Japan

Shigeru Yoshimura

This inventor holds 1 USPTO granted patent. Top assignees: Ngk Electronics Devices, Inc., Ngk Insulators, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeru Yoshimura. Retrieved from https://idiyas.com/inventor/shigeru-yoshimura-atsoojf8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Shigeru Yoshimura: Innovator in Metal Plating Technology

Introduction

Shigeru Yoshimura is a notable inventor based in Shimonoseki, Japan. He has made significant contributions to the field of metal plating technology, particularly through his innovative patent.

Latest Patents

Yoshimura holds a patent for a "Metal member and production method therefor." This invention involves a metal member that includes a metal substrate, a first intermediate plating layer, a second intermediate plating layer, and a precious metal plating layer. The metal substrate is characterized by a surface made up of multiple crystal grains. The first intermediate plating layer is directly formed on these crystal grains and contains a nickel element, while being non-oriented with respect to the crystal orientations. The second intermediate plating layer is formed on the first, followed by the precious metal plating layer on top.

Career Highlights

Throughout his career, Shigeru Yoshimura has worked with prominent companies such as NGK Electronics Devices, Inc. and NGK Insulators, Inc. His experience in these organizations has contributed to his expertise in metal technology and innovation.

Collaborations

(Section skipped due to space constraints.)

Conclusion

Shigeru Yoshimura's work in metal plating technology exemplifies the impact of innovative thinking in industrial applications. His patent reflects a deep understanding of material science and engineering principles.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…