Shigeru Takehiro

Title: Shigeru Takehiro: Innovator in Plasma CVD Technology

Introduction

Shigeru Takehiro is a notable inventor based in Chiba, Japan, recognized for his contributions to the field of plasma chemical vapor deposition (CVD). With two patents to his name, he has made significant strides in improving the technology used for semiconductor manufacturing.

Latest Patents

Takehiro's latest patents focus on enhancing the design of plasma CVD chambers. His invention, titled "Upper Chamber for High Density Plasma CVD," addresses the need for uniform conditions in film formation on substrates. The design improves temperature control within the upper chamber, effectively minimizing temperature fluctuations during deposition and non-deposition cycles. Key components of this innovation include a dome with a flat top, a top RF coil larger than the substrates, and a cold plate designed to maintain stability during processing.

Another relevant patent, simply titled "High Density Plasma CVD Chamber," shares similar objectives. This invention maintains the uniform conditions necessary for creating thin CVD films on semiconductor substrates. It features a chamber design that includes a side RF coil, carefully spaced from the top RF coil to optimize the processing environment.

Career Highlights

Shigeru Takehiro works for Applied Materials, Inc., a leading company in providing manufacturing solutions to the semiconductor industry. His inventions contribute to the advancement of technologies that underpin the production of electronic devices, further establishing his status as an influential figure in his field.

Collaborations

Throughout his career, Takehiro has collaborated with noteworthy colleagues, including Sudhir R Gondhalekar and Tom K Cho. These partnerships facilitate the exchange of innovative ideas and drive forward the development of advanced manufacturing technologies.

Conclusion

Shigeru Takehiro's work embodies the spirit of innovation in the semiconductor industry. His patented technologies enhance the efficiency and effectiveness of plasma CVD processes, contributing to the evolution of electronic device manufacturing. As innovation continues to shape the future, Takehiro remains a key figure to watch in the realm of semiconductor technology.