This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1994.
Company Filing History:
Years Active: 1994
Title: Shigeru Suwa: Innovator in Exposing Technology
Introduction
Shigeru Suwa is a notable inventor based in Kanuma, Japan. He has made significant contributions to the field of exposing technology, particularly with his innovative methods that enhance the efficiency of image processing.
Latest Patents
Shigeru Suwa holds a patent for an "Exposing method and apparatus." This invention involves a method of exposing an object from both sides, where the object is coated with photosensitive material on both sides. The method utilizes a first mask plate and a second mask plate, each equipped with specific masking patterns. The process includes simultaneously image-sensing alignment patterns to ensure precise alignment and positioning of the mask plates.
Career Highlights
Suwa is associated with Kabushiki Kaisha Toshiba, a leading company in technology and innovation. His work has contributed to advancements in exposing methods, which are crucial for various applications in imaging and manufacturing.
Collaborations
Shigeru Suwa has collaborated with notable colleagues, including Yukitaka Miyata and Tatsuhiko Asaka. Their combined expertise has furthered the development of innovative technologies in their field.
Conclusion
Shigeru Suwa's contributions to exposing technology exemplify the impact of innovation in enhancing imaging processes. His patent and collaborative efforts reflect a commitment to advancing technology in meaningful ways.