Kabushiki Kaisha Toshiba

Shigeru Suwa

Hisashi Iijima

Tatsuhiko Asaka

Yukitaka Miyata

A method of exposing an object from both sides thereof, wherein the object has photosensitive material coated on both sides thereof and it is held between a first mask plate provided with a first masking pattern and a second mask plate provided with a second masking pattern. This exposing method comprises simultaneously image-sensing first and second alignment patterns formed at those areas on the inner sides of the first and second mask plates where the object is not held by the first and second mask plates so as to obtain an image signal, the first and second alignment patterns being in a predetermined positional relation when the first and second mask plates are correctly aligned with each other, processing the image signal to determine the positionally misregistered amount of the first and second alignment patterns from the predetermined positional relation, and moving one of the first and second mask plate in the facial direction thereof on the basis of the positionally misregistered amount of the alignment pattern thus determined to return the first and second alignment patterns to the predetermined positional relation.

Growing community of inventors

Kanuma, Japan

Shigeru Suwa