Shigeru Sankawa, Sr

Title: Shigeru Sankawa, Sr: Innovator in Silicon Substrate Technology

Introduction

Shigeru Sankawa, Sr. is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of silicon substrates. His innovative work has led to the creation of a unique silicon substrate with a textured surface, which has important applications in various electronic devices.

Latest Patents

Shigeru Sankawa, Sr. holds a patent for a "Silicon substrate having textured surface, and process for producing same." This invention addresses the challenge of providing a novel silicon substrate with a textured surface by utilizing a dry-etching process on a silicon substrate with (111) orientation. The resulting substrate features multiple protrusions, each comprising three slant faces, with heights ranging from 100 to 8000 nm. The process involves preparing a silicon substrate with (111) orientation and blowing an etching gas, which may include gases such as ClF3, XeF2, BrF3, BrF5, and NF3, onto its surface.

Career Highlights

Shigeru Sankawa, Sr. is associated with Panasonic Intellectual Property Management Co., Ltd., where he continues to innovate and contribute to advancements in technology. His work has not only enhanced the performance of silicon substrates but has also paved the way for further research and development in the semiconductor industry.

Collaborations

Throughout his career, Shigeru has collaborated with esteemed colleagues, including Yasushi Taniguchi and Kouji Arai. These partnerships have fostered a creative environment that encourages the exchange of ideas and the pursuit of groundbreaking innovations.

Conclusion

Shigeru Sankawa, Sr. is a distinguished inventor whose work in silicon substrate technology has made a lasting impact on the semiconductor industry. His innovative patent and collaborations with other professionals highlight his commitment to advancing technology.