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For the Inventor, By the Inventor

Ichihara, Japan

Shigeo Tanaka

This inventor holds 7 USPTO granted patents. Top assignees: Sumitomo Chemical Company, Limited, Hitachi Chemical Company, Ltd., Nippon Steel Chemical Co., Ltd.. Active years: 1978-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeo Tanaka. Retrieved from https://idiyas.com/inventor/shigeo-tanaka-p8g4vcse

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7

% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 4

Forward Citations = 40(Granted Patents)


Location History:

  • Ichihara, JA (1978)
  • Chiba, JP (1985)
  • Ichihara, JP (1982 - 1998)
  • Hitachi, JP (2016)

Company Filing History:

goldMedal5 out of 6,965 
 
Sumitomo Chemical Company, Limited
 patents
silverMedal2 out of 1,641 
 
Hitachi Chemical Company, Ltd.
 patents
bronzeMedal1 out of 173 
 
Nippon Steel Chemical Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1978-2016

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7 patents (USPTO):Explore Patents
1. 9235121 - Photosensitive resin composition, photosensitive film, permanent resist and method for producing permanent resist (2016-01-12),
2. 5840229 - Method for producing molded article by powder slush molding a (1998-11-24),
3. 4883842 - Resin composition (1989-11-28),
4. 4499238 - Thermoplastic resin products having pearl-like luster (1985-02-12),
5. 4492789 - Epoxy resin composition (1985-01-08),
6. 4312964 - Polyolefin resin composition (1982-01-26),
7. 4066718 - Process for the production of ethylene-propylene block copolymers (1978-01-03),

Title: Shigeo Tanaka: Innovator in Photosensitive Resin Technology

Introduction

Shigeo Tanaka is a prominent inventor based in Ichihara, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 7 patents. His work has advanced the development of materials used in various applications, particularly in the electronics and manufacturing industries.

Latest Patents

Tanaka's latest patents include a photosensitive resin composition and a method for producing a permanent resist. The photosensitive resin composition comprises several components, including an acid-modified epoxy resin and a photopolymerizable monomer. This innovative composition is designed to meet specific conditions, enhancing its performance in various applications. Additionally, he has developed a method for producing molded articles using thermoplastic elastomer powder, which showcases his expertise in material science.

Career Highlights

Throughout his career, Shigeo Tanaka has worked with notable companies such as Sumitomo Chemical Company, Limited and Hitachi Chemical Company, Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in resin technology.

Collaborations

Tanaka has collaborated with esteemed colleagues, including Noriyuki Sekine and Kazuo Tanaka. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Shigeo Tanaka's contributions to the field of photosensitive resin technology are noteworthy. His innovative patents and collaborations reflect his dedication to advancing material science. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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