Company Filing History:
Years Active: 2008
Title: Shigemitsu Sato: Innovator in Sputtering Technology
Introduction
Shigemitsu Sato is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of sputtering technology, which is essential in various manufacturing processes, particularly in the production of thin films.
Latest Patents
Sato holds a patent for a "Sputter source, sputtering device, and sputtering method." This invention allows for the movement of targets with respect to a substrate during the sputtering process. As a result, the entire area of the substrate is effectively opposed to the targets, enabling the formation of a film of homogeneous quality on the substrate's surface. Additionally, the invention incorporates the movement of magnetic field forming devices, which enhances the sputtering efficiency over a larger area. This innovation ensures that the thickness distribution of the film formed on the substrate is uniform.
Career Highlights
Sato is currently associated with Ulvac, Inc., a company known for its advanced vacuum technology and equipment. His work has been instrumental in advancing sputtering techniques, which are widely used in the semiconductor and electronics industries.
Collaborations
Sato has collaborated with notable colleagues, including Masasuke Matsudai and Hiroki Oozora. Their combined expertise has contributed to the development of innovative solutions in the field of sputtering technology.
Conclusion
Shigemitsu Sato's contributions to sputtering technology exemplify the importance of innovation in manufacturing processes. His patent reflects a significant advancement that enhances the quality and efficiency of thin film production.