Shigemitsu Maruno

Title: Shigemitsu Maruno: Innovator in Semiconductor Technology

Introduction

Shigemitsu Maruno is a prominent inventor based in Hyogo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative work has led to advancements in the manufacturing methods of semiconductor devices.

Latest Patents

Maruno's latest patents include a semiconductor device and manufacturing method that involves the formation of a polysilicon nitride film to cover a polysilicon gate. Through heat treatment in an oxygen atmosphere, a silicon oxinitride film is created. This process allows for the anisotropic etching of the silicon oxinitride and silicon nitride films, resulting in a sidewall insulating film. The method also includes epitaxial growth to form selective silicon films of prescribed thickness on source and drain regions, ensuring that silicon islands do not deposit on the surface of the sidewall insulating film. This innovation leads to a semiconductor device featuring a transistor with superior electrical insulation.

Another notable patent focuses on a semiconductor device that reduces the sheet resistance of source and drain regions. In this method, source and drain diffusion regions are strategically formed on a silicon substrate, sandwiching a gate electrode. Sidewall oxide films are created on each side surface of the gate electrode, and recessed portions are formed beneath these films. The resulting source and drain electrodes fill these recessed portions, significantly reducing the sheet resistance and enhancing the current drivability of the field-effect transistor.

Career Highlights

Shigemitsu Maruno is associated with Mitsubishi Electric Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing devices that improve performance and efficiency in electronic applications.

Collaborations

Maruno has collaborated with notable colleagues such as Taisuke Furukawa and Takumi Nakahata. Their combined expertise has contributed to the successful development of innovative semiconductor solutions.

Conclusion

Shigemitsu Maruno's contributions to semiconductor technology exemplify the spirit of innovation. His patents reflect a commitment to advancing the field and improving the functionality of electronic devices. His work continues to influence the industry and inspire future developments in semiconductor technology.