Tokyo, Japan

Shigemi Miyazaki

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigemi Miyazaki. Retrieved from https://idiyas.com/inventor/shigemi-miyazaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Shigemi Miyazaki: Innovator in Semiconductor Manufacturing

Shigemi Miyazaki is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing. His work focuses on enhancing the efficiency and accuracy of semiconductor production processes.

Latest Patents

Miyazaki holds a patent for a semiconductor manufacturing apparatus. This innovative apparatus includes a particle monitor that counts fine particles in the exhaust gas of a process chamber. The end point detection controller observes the count value over time to determine the end point of plasma etching or cleaning. Additionally, the apparatus allows for high-accuracy calibration of the particle monitor's detection capabilities. He has 1 patent to his name.

Career Highlights

Miyazaki is associated with Mitsubishi Electric Corporation, a leading company in the electronics and semiconductor industry. His work has contributed to advancements in manufacturing technologies that are crucial for the production of modern electronic devices.

Collaborations

Some of his notable coworkers include Hisashi Tsukazaki and Makoto Doi. Their collaborative efforts have furthered the development of innovative solutions in semiconductor manufacturing.

Conclusion

Shigemi Miyazaki's contributions to semiconductor manufacturing demonstrate his commitment to innovation and excellence in technology. His patent reflects a significant advancement in the field, showcasing his expertise and dedication to improving manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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