The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 1998

Filed:

Feb. 12, 1997
Applicant:
Inventors:

Hisashi Tsukazaki, Tokyo, JP;

Makoto Doi, Tokyo, JP;

Shigemi Miyazaki, Tokyo, JP;

Akira Oohisa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
156345 ; 1187 / ; 1341043 ; 20429802 ; 20429831 ;
Abstract

In a semiconductor manufacturing apparatus, the number of fine particles is counted by a particle monitor 15 mounted to a part of an exhaust pipe 12 for exhausting a gas in a process chamber 4, and an end point detection controller 31 observes the count value in time sequence to detect an end point time of plasma etching or plasma cleaning. Further, in a semiconductor manufacturing apparatus, it is possible to calibrate a detection accuracy of the particle monitor with high accuracy.


Find Patent Forward Citations

Tsukazaki, Hisashi. (1998). Semiconductor manufacturing apparatus (U.S. Patent No. 5837094). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5837094

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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